Method of forming a conductive pattern and method

专利名称：Method of forming a conductive pattern and

method of manufacturing an organic light-emitting display including the same

发明人：Taehyun Kim,Sangho Park,Seungmin

Lee,Jungkyu Lee

申请号：US15214637申请日：20160720公开号：US09711750B1公开日：20170718

专利附图：

摘要：A conductive material layer for forming a conductive pattern is formed on a

substrate. A photosensitive organic material layer is formed on the conductive materiallayer. The photosensitive organic material layer is irradiated through a halftone mask.The halftone mask includes a first mask region having a boundary corresponding to anedge of the conductive pattern, a second mask region, and a third mask region disposedbetween the first mask region and the second mask region. A first pattern including afirst region corresponding to the first mask region and a second region corresponding tothe third mask region is formed by removing the photosensitive organic material layer.The conductive material layer is etched using the first pattern as a hard mask to form theconductive pattern having exposed lateral surfaces. A second pattern is formed thatcovers the lateral surfaces of the conductive pattern by reflowing the first pattern.

申请人：SAMSUNG DISPLAY CO., LTD.

地址：Yongin-si, Gyeonggi-Do KR

国籍：KR

代理机构：F. Chau & Associates, LLC

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