专利名称：Method and apparatus for inspecting
resistance to film draw-out
发明人：Makoto Shimizu,Katutoshi
Nakamura,Noriyuki Furusawa
申请号：US07/353440申请日：19890518公开号：US04925119A公开日：19900515
摘要：A method for inspecting resistance to film draw-out comprises the steps ofholding a magazine in which photographic film wound around a spool is accommodated,rotating the spool in the direction that winds up the film around the spool, detecting themovement of a film leader, which has been drawn out from the magazine, to themagazine, and measuring the force required to rotate the spool when the movement ofthe film leader is detected. An apparatus for inspecting resistance to film draw-outcomprises a magazine holder, and a spool rotation device for rotating the spool in thedirection that winds up the film around the spool. A rotating force measurement devicemeasures the force required for the spool rotation device to rotate the spool, and a filmmovement detector detects the movement of a film leader, which has been drawn outfrom the magazine, to the magazine. A device receives the output of the film movementdetector and samples the output of the rotating force measurement device when themovement of the film leader is detected by the film movement detector.
申请人：FUJI PHOTO FILM CO., LTD.
代理机构：Sughrue, Mion, Zinn, Macpeak & Seas
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