PARTICLE SOURCE AND MANUFACTURING METHOD THEREOF

专利名称：PARTICLE SOURCE AND MANUFACTURING

METHOD THEREOF

发明人：LIU, HUARONG,CHEN, PING申请号：EP12721399申请日：20120504公开号：EP2629316A4公开日：20140129

摘要：The present disclosure provides a method for manufacturing a particle sourcecomprising: placing a metal wire in vacuum, introducing active gas, adjusting a

temperature of the metal wire and applying a positive high voltage V to the metal wire togenerate at a side of the head of the metal wire an etching zone in which field inducedchemical etching (FICE) is performed; increasing by the FICE a surface electric field at thetop of the metal wire head to be greater than a field evaporation electric field ofmaterial for the metal wire, so that metal atoms at the top of the metal wire areevaporated off; after the field evaporation is activated by the FICE, causing mutualadjustment between the FICE and the field evaporation, until the head of the metal wirehas a shape of combination of a base and a tip on the base; and stopping the FICE and thefield evaporation when the head of the metal wire takes a predetermine shape.

申请人：38TH RESEARCH INSTITUTE, CHINA ELECTRONICS TECHNOLOGY GROUPCORPORATION

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