专利名称：LIQUID SPRAYING METHOD, LIQUID
SPRAYING SYSTEM AND LIQUID SPRAYINGEXECUTE PROGRAM
发明人：Ichiro Yamamoto申请号：US11531610申请日：20060913
公开号：US20070161201A1公开日：20070712
专利附图：
摘要：A semiconductor device is provided which has a capacitor insulating film madeup of zirconium aliminate being an amorphous film obtained by having crystalline
dielectric contain amorphous aluminum oxide and having its composition ofAlZrO(0.05≦X≦0.3), hereby being capable of preventing, in a process of forming acapacitor of MIM (Metal Insulator Metal) structure, dielectric breakdown of a capacitorinsulating film while a relative dielectric constant of a metal oxide film used as thecapacitor insulating film is kept high.
申请人：Ichiro Yamamoto
地址：Kawasaki JP
国籍：JP
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